ASML Ships Industry's First High-NA EUV Litho Scanner To Intel
Anand Tech
DECEMBER 21, 2023
Intel will be using the new machine to experiment with High-NA EUV before it deploys commercial grade Twinscan EXE:5200 tool for high-volume manufacturing (HVM) sometime in 2025. High numerical aperture (High-NA) EUV lithography tools featuring a 0.55 But ASML's Twinscan EXE lithography tools with a 0.55
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